Hydrofluorosilicic Acid CAS 16961-83-4

CAS：16961-83-4
Zuiverheid: het 99%
Molecular Formula：F6H2Si
Molecular Weight：144.09
Storage Period：1 year
Storage Period：:SILICOFLUORIC ACID; SYSMEHFRWGKPVGKKRRPVKVYPNGAEDESAEAFPLEF; HYDROGEN HEXAFLUOROSILICATE;

What is Hydrofluorosilicic Acid CAS 16961-83-4?

Hexafluorosilicic acid, with the molecular formula Hexafluorosilicic acid, is an inorganic strong acid produced by dissolving fluosilicic anhydride in water. Industrially, hydrofluorosilicic acid is mainly generated as a by-product of wet phosphate fertilizers or through the reaction of hydrofluoric acid with silicon dioxide.

Specificatie

ITEM	STANDAARD
Uiterlijk	Kleurloze transparante vloeistof
Total effective content(%)	99%

Toepassingen

1. Prepare fluorosilicate products
This is its main industrial application. Hydrofluosilicic acid reacts with alkali metal compounds such as sodium and potassium salts to form fluorosilicates like sodium fluosilicate and potassium fluosilicate.
Sodium fluosilicate: Hydrofluorosilicic acid is used as a flux for enamel and a whitening agent for glass. Hydrofluorosilicic acid is also a raw material for agricultural insecticides and fungicides, and can be used in the production of concrete strengthening agents.
Potassium fluosilicate: Hydrofluorosilicic acid is commonly used as a welding flux, in ceramic manufacturing, and as a mold release agent for aluminum-magnesium alloys.
2. Fluorination treatment of drinking water and industrial water
Low-concentration hydrofluosilicic acid (usually diluted for use) can be used as a fluorinating agent for drinking water, adding an appropriate amount of fluoride ions to the water to prevent tooth decay. Hydrofluorosilicic acid is one of the economical and efficient fluoride sources in public water supply systems. Hydrofluorosilicic acid can also be used for the water quality stabilization treatment of industrial circulating cooling water.
3. Metal surface treatment and etching
Hydrofluorosilicic acid is used for surface cleaning and passivation of metals (such as aluminum and stainless steel), removing oxides and dirt from the metal surface and enhancing the adhesion of metal coatings.
As a component of glass etching agents, it participates in the pattern engraving and sandblasting treatment of glass products, and can also be used for the light etching of silicon wafers in the electronics industry.